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AKONIS

Fully automated SIMS for high-volume semiconductor manufacturing

The AKONIS SIMS tool fills a critical gap in semiconductor fabrication processes by providing high throughput, high precision detection for implant profiles, composition analysis and interfacial data to enable high-volume manufacturing. AKONIS provides a very high level of automation to ensure repeatability across tools for fab level process control and tool-to-tool matching.

  • AKONIS: SIMS Excellence Brought to the Fab! +


    Complementing the IMS Wf/SC Ultra as well as the SIMS 4550 (quadrupole SIMS) used to support the semiconductor industry via characterization labs, AKONIS - with full automation of instrument set-up and acquisition routines - enables rapid, within-fab analysis without compromise in analytical sensitivity. AKONIS benefits from recent development in EXtremely Low Impact Energy (EXLIE) ionic column technology (< 150 eV), coupled with a full wafer handling system including a high resolution stage enabling measurements on pads down to 20 μm.

    The high yield enabler on N5 and beyond
    • High resolution composition and fast dopant depth profiling of SiGe and SiP multilayer stacks
    • Unrivalled in pad detection limits down to 20 μm
    • More than 97% of time reduction to feedback data to the process line
    • Blanket and patterned full wafer measurement
    • Pattern recognition engine coupled with high resolution interferometric stage for < 2 μm position accuracy
    • Intuitive recipe creation based on unique material database
    • SEMI certified (S2/S8, E4, E5, E39, E84...)
    • Low cost of ownership

  • View Webinars +

    • Dynamic SIMS for Semiconductors

      Thursday, September 16, 2021

      A review of a broad array of IC applications with Dynamic SIMS, from deep to ultra-shallow implant depth profiling in Si-based semiconductors to compositional analysis of thin multilayers in patterned wafer pads, optoelectronics, 2D and non-planar 3D structures. Speaker: Pawel Michałowski, expert-user of CAMECA SC Ultra SIMS at Łukasiewicz Research Network – Institute of Microelectronics and Photonics, Poland
      ↓ Duration : 20 minutes
      Click here to view

  • Documentation & white papers +

  • Video +

    • Monitoring of etching processes in a High Volume Manufacturing environment with AKONIS SIMS
      AKONIS Manufacturing and HVM

      The AKONIS SIMS tool accurately measures elemental concentrations in novel forksheet 3D structures for different etching rates, outperforming other analytical systems for sensitivity in a High Volume Manufacturing environment.

    • Arsenic shallow implant monitoring with AKONIS
      AKONIS https://youtu.be/VuhyPS8hFiE

      The AKONIS automated SIMS tool outperforms other analytical systems for dose uniformity control at customer site. In this video, the tool measured 1.2% non-uniformity on arsenic shallow implants over full wafers.

    • SiP metrology for logic n-mos production with AKONIS SIMS tool
      AKONIS-ep2

      Thanks to its unique single detector technology, AKONIS performs long-term stability monitoring of shallow phosphorus implants in silicon.

    • SPC of Logic p-mos with AKONIS SIMS tool
      AKONIS

      Thanks to a proven single detector technology, the AKONIS automated SIMS tool ensures unequalled long-term stability Boron in SiGe monitoring at customer site.

    • AKONIS, SIMS Excellence brought to the fab
      AKONIS

      A fully automated semiconductor metrology tool enabling implant dose monitoring in advanced logic chips, control of doping levels in the transistor source & drain, compositional analysis within 20 µm test pads on patterned silicon wafers, and more!